XEI Scientific Inc, maker of the popular EVACTRON^® De-Contaminator Plasma Cleaning System for electron microscopes and other vacuum chambers, announce that they have begun shipments of the Evactron TEM Wand^TM systems.

Specifically designed to deliver the proven downstream plasma cleaning technique efficiently to critical areas of the Transmission Electron Microscope (TEM), the Evactron TEM Wand allows microscopists to easily clean the sample introduction, goniometer and pole piece areas of their microscopes. Removal of the unwanted carbon contamination provides clearer images and data without artifacts.

Ron Vane, President and founder of XEI, stated "Now that we have delivered systems to two Japanese manufacturers of TEMs as well as to end-user customers, we are looking forward to widespread adoption of these tools just as we saw with Evactron systems for Scanning Electron Microscopes and Dual Beam FIBs. Further, we are excited about the localized plasma cleaning concept, where it may not be necessary to clean entire vacuum systems but more efficient to just clean critical areas. We envision this localized solution will also be valuable in other markets, reducing the need for high power and long cleaning times."

XEI Scientific will be exhibiting at the Microscopy & Microanalysis conference in Phoenix AZ, July 29 - August 2. In addition to the XEI booth #520, Evactron De-Contaminator systems will also be on display in the Carl Zeiss exhibit (booth #604) on a Merlin SEM. Please visit with us and learn about the latest solutions in plasma cleaning both on the desk-top and in your electron microscopes.

XEI has now sold nearly 1,400 Evactron systems worldwide solving contamination problems in many different environments using instrumentation such as electron microscopes, FIBs and other vacuum sample chamber set-ups.

For more information visit www.evactron.com


About XEI Scientific, Inc.

XEI Scientific Inc. invented the Evactron De-Contaminator in 1999 as the first plasma cleaner to use a downstream cleaning process to remove carbon from electron microscopes. A proprietary plasma source uses air to produce oxygen radicals for oxidation of carbon compounds for removal by the pumps. Carbon-free-vacuum produces the highest quality images and analytical results from SEMs, TEMs and other vacuum analytical instruments. XEI innovations include a unique RF plasma generator, a patented RF electrode and easy start programmed plasma cleaning. All XEI products come with a 5 year warranty and are compliant with CE, NRTL and Semi-S2 safety standards. XEI offers a variety of Evactron systems to meet user needs and has nearly 1400 installations around the world