PIE Scientific, a leader in low pressure high efficiency plasma source manufacturing, has recently released a revolutionary downstream plasma cleaner---SEMI-KLEEN plasma cleaner.
It is designed to meet the toughest contamination requirements from the semiconductor capital equipment industry. The revolutionary low plasma potential discharge technique greatly reduces the risk of ion sputtering damage. Together with a proprietary two-stage filter gas delivery system, SEMI-KLEEN plasma cleaner has been proven capable of meeting particle contamination requirement for sub 10nm nodes....
It is designed to meet the toughest contamination requirements from the semiconductor capital equipment industry. The revolutionary low plasma potential discharge technique greatly reduces the risk of ion sputtering damage. Together with a proprietary two-stage filter gas delivery system, SEMI-KLEEN plasma cleaner has been proven capable of meeting particle contamination requirement for sub 10nm nodes....