GLOBALFOUNDRIES, Intel, Samsung
Electronics, and TSMC are the members of the SEMATECH EMI Partnership.
According to the slot assignment two out of the four semiconductor companies have
placed orders with Carl Zeiss Semiconductor Metrology Systems (SMS) Division.
Carl Zeiss SMS develops the AIMS
TM EUV tool in cooperation with the scanner
optics department of Carl Zeiss SMT, Lithography Optics (LIT), and external
partners.
"The orders represent
an important milestone in the development of AIMS
TM EUV and confirm the
relevance of EUV technology for the industry. We expect the remaining two EMI
members to place their orders in accordance with their slot assignments agreed
upon at the start of the EMI consortium." said Dr. Oliver Kienzle,
Managing Director of Carl Zeiss SMS. The AIMS
TM EUV platform represents a
critical tool for the development and manufacturing of defect-free EUVL masks
supporting the 22 nm half-pitch (HP) technology node requirements with
extendibility to the 16 nm HP node. A first production-worthy version of the
platform is scheduled for delivery in the third quarter of 2014.
SEMATECH launched EMI in
2010 to fill a key infrastructure gap for EUV in the area of mask manufacturing,
by funding development of critical metrology tools. EMI is administered by
SEMATECH's Lithography Program, based at the College of Nanoscale Science and
Engineering (CNSE) of the University at Albany.
To initiate EMI's first
major project, SEMATECH and Carl Zeiss have signed a collaboration agreement
for the development and manufacturing of the industry's first-ever actinic
aerial image metrology EUV system targeted for EUVL volume production.
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